ALD/CVD前驱体：高纯度金属有机源，赋能先进薄膜沉积研发
2026-08-17 · 应用介绍 · 百灵威授权转载
原子层沉积（ALD）与化学气相沉积（CVD）是半导体制造中实现纳米级薄膜精准控制的核心技术，广泛应用于高κ介质、金属栅极、扩散阻挡层及新兴二维材料等前沿领域。前驱体的纯度、挥发性和批次稳定性直接决定薄膜质量与工艺窗口。百灵威提供覆盖钴、钌、钨、铂、钛、钽、铪、钼、铌等多种金属的科研级高纯前驱体，纯度达4N~5N，适配半导体材料研发的严苛要求。核心产品支持克级到公斤级灵活包装，并提供专用钢瓶适配各类ALD/CVD设备。
ALD/CVD沉积材料，一站式高纯前驱体解决方案
百灵威CVD/ALD前驱体：精准沉积的核心材料伙伴
产品特点与优势
高纯品质：核心产品纯度≥99.99%（4N）metal basis，部分达99.9999%（6N），金属杂质<0.1 ppm，确保薄膜电学性能与工艺可重复性。
品类全面：覆盖钴、钌、钨、铂、钼、镍、锡、钛、钽、铪、铌等多种金属有机前驱体，满足导电薄膜、氮化物/碳化物薄膜、高κ介质等多元沉积需求。
即用型包装：液态及易升华固态前驱体均可提供50 mL/60 mL不锈钢钢瓶，适配主流ALD/CVD设备的直接液体注入或鼓泡器系统。
批次一致性好：严格质控，确保每批次品质如一，节省工艺验证时间。
适用场景
• 半导体制造中金属栅极、互连种子层、扩散阻挡层（TiN、TaN、WN）的ALD/CVD沉积；
• DRAM电容电极、新型存储器电极材料沉积；
• 二维过渡金属硫族化合物（MoS₂、WS₂等）及异质结器件的CVD合成；
• 金属硅化物接触层、MEMS结构层及抗腐蚀涂层。
核心推荐产品清单
钴前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Bis(cyclopentadienyl)cobalt(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(环戊二烯基)钴 | 1277-43-6 | 941710 |
| Bis(pentamethylcyclopentadienyl)cobalt(II), ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(五甲基环戊二烯基)钴(II) | 74507-62-3 | 924019 |
| Bis{[μ-[[di(trimethylsilyl)amide]}bis{[di(trimethylsilyl)amide]}dicobalt(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双{[μ-[[二(三甲基甲硅烷基)酰胺]}双{[[[二三甲基甲硅烷基)酰胺]}双钴(II) | 93280-44-5 | 1880209 |
钌前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)ruthenium(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酮酸)钌 | 38625-54-6 | 147692 |
| 2,3-Dimethyl-1,3-butadiene-tricarbonyl ruthenium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder (2,3-二甲基-1,3-丁二烯)三羰基钌(0) | 52649-53-3 | 9248430 |
| Triruthenium dodecacarbonyl, 98% 十二羰基三钌 | 15243-33-1 | 526096 |
钨/钼前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Tungsten hexacarbonyl, 99.99%, Used for CVD 六羰基钨 | 14040-11-0 | 184972 |
| Bis(cyclopentadienyl)cobalt(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(环戊二烯基)钴 | 1277-43-6 | 941710 |
铂前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| (Trimethyl)methylcyclopentadienylplatinum(IV), 99%, 78-1350, contained in 50 ml Swagelok® cylinder (96-1070) for CVD/ALD (三甲基)甲基环戊二烯基铂(IV) | 94442-22-5 | 98-4024 |
钛前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Tetrakis(dimethylamino)titanium, ICPMS-99.9999% 四(二甲氨基)钛 | 3275-24-9 | 952803新 |
| Tetrakis(ethylmethylamino)titanium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 四(乙基甲氨基)钛(IV) | 175923-03-2 | 9186316 |
| Tetrakis(diethylamino)titanium(IV), 99.999% 四(二乙氨基)钛(IV) | 4419-47-0 | 903906 |
钽前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| (t-Butylimido)tris(diethylamino)tantalum(V), 99.9999% 三(二乙氨基)(叔丁基亚氨基)钽(V) | 169896-41-7 | 289272 |
| (t-Butylimido)tris(ethylmethylamino)tantalum(V), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(乙基甲氨基)(叔丁基亚氨基)钽(V) | 511292-99-2 | 345773 |
| Pentakis (dimethylamino)tantalum(V), 98% 五(二甲氨基)钽(V) | 19824-59-0 | 579965 |
铪前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Tetrakis(ethylmethylamino) hafnium (IV), ICP-99.99% 四(甲乙基氨基)铪(IV) | 352535-01-4 | 997501 |
铌/钒前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Niobium(V) ethoxide , 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 五乙醇铌(V) | 3236-82-6 | 963633 |
| (t-Butylimido)tris(diethylamino)niobium(V), 99.999% (叔丁基亚氨基)三(二乙氨基)铌(V) | 210363-27-2 | 1177614 |
| Tetrakis(ethylmethylamino)vanadium(IV), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 四(乙基甲基氨基)钒(IV) | 791114-66-4 | 2445938 |
其他金属前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium tetraglyme adduct, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(2,2,6,6-四甲基-3,5-庚二酮酸)锶四甘醇二甲醚加成物 | 150939-76-7 | 529991 |
| Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium hydrate, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(2,2,6,6-四甲基-3,5-庚二酮酸)钡 | 17594-47-7 | 924172 |
| Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)bismuth(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酸)铋 | 142617-53-6 | 916543 |
| Diethylaminolithium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二乙氨基锂(I) | 816-43-3 | 540112 |
| Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)calcium, 99.99% 双(2,2,6,6-四甲基-3,5-庚二酮)钙 | 118448-18-3 | 988511 |
| Lithium cyclopentadienide, ≥99.99% trace metal analysis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 环戊二烯基锂(I) | 16733-97-4 | 948701 |
推荐阅读
Strem优势产品推荐——用于ALD/CVD的铂前体ALD/CVD沉积材料，一站式高纯前驱体解决方案
百灵威CVD/ALD前驱体：精准沉积的核心材料伙伴
