金属薄膜与导电薄膜CVD/ALD前驱体
2026-06-10 · 系列介绍 · 百灵威授权转载
在半导体制造中，金属薄膜（如Co、Ru、W、Cu、Pt、Mo）用于栅电极、接触插塞、阻挡层及互联金属线。原子层沉积可实现保形性优异的超薄金属层。我司提供高纯度金属有机前驱体，覆盖钴、钌、钨、铂、钼、镍、锡等，适用于金属、金属氮化物及金属硅化物的CVD/ALD沉积。
产品优势及特点：
- - 多种金属种类：钴、钌、钨、铂、钼、镍、锡等前驱体，满足不同导电薄膜需求。- - 高纯度与可控杂质：≥99.99% metal basis，部分产品达到99.9999%，确保薄膜电学性能。
- - 液体/固体可选：多数前驱体为液态或易升华固体，提供专用钢瓶及升华器。
- - 低电阻率薄膜：通过优化沉积条件可得到高质量金属膜。
应用场景：
- - 金属栅极、互连种子层、扩散阻挡层- - 电容电极、电阻存储器电极层
- - 金属硅化物接触层
核心推荐产品清单
钴前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Bis(cyclopentadienyl)cobalt(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(环戊二烯基)钴 | 1277-43-6 | 941710 |
| Bis(pentamethylcyclopentadienyl)cobalt(II), ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(五甲基环戊二烯基)钴(II) | 74507-62-3 | 924019 |
| Bis{[μ-[[di(trimethylsilyl)amide]}bis{[di(trimethylsilyl)amide]}dicobalt(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双{[μ-[[二(三甲基甲硅烷基)酰胺]}双{[[[二三甲基甲硅烷基)酰胺]}双钴(II) | 93280-44-5 | 1880209 |
钌前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)ruthenium(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酮酸)钌 | 38625-54-6 | 147692 |
| 2,3-Dimethyl-1,3-butadiene-tricarbonyl ruthenium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder (2,3-二甲基-1,3-丁二烯)三羰基钌(0) | 52649-53-3 | 9248430 |
| Triruthenium dodecacarbonyl, 98% 十二羰基三钌 | 15243-33-1 | 526096 |
钨前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Tungsten hexacarbonyl, 99.99%, Used for CVD 六羰基钨 | 14040-11-0 | 184972 |
| Tungsten(VI) chloride (99.9%-W) 六氯化钨 | 13283-01-7 | 74-2350 |
| Bis(t-butylimido)bis(dimethylamino)tungsten(VI), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(二甲氨基)二(叔丁基亚氨基)钨(VI) | 406462-43-9 | 918995 |
镍/锡/铂前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Bis(N,N'-di-t-butylacetamidinato)nickel(II), 99.999% 二(N,N'-二-叔丁基乙脒基)镍(II) | 940895-79-4 | 1751074 |
| Bis(methylcyclopentadienyl)nickel, 99.999% 二(甲基环戊二烯基)镍(II) | 1293-95-4 | 930278 |
| bis(dimethylamino-2-methyl-2-butoxo)nickel, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(二甲氨基-2-甲基-2-丁氧基)镍(II) | 942311-35-5 | 9181010 |
| Tin(II) acetylacetonate, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(乙酰丙酮酸)锡(II) | 16009-86-2 | 111772 |
| Tin(IV) tert-butoxide, 99.99% 叔丁氧锡(IV) | 36809-75-3 | 204504 |
锰/铟/铝/钼/铂前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Bis(ethylcyclopentadienyl)ruthenium(II), 99.99%, trace metals basis 双(乙基环戊二烯基)钌(II) | 32992-96-4 | 588417 |
| Bis(ethylcyclopentadienyl)manganese, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(乙基环戊二烯基)锰(II) | 101923-26-6 | 953383 |
| DimethylAminopropyl-Dimethyl Indium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder [3-(二甲氨基)丙基]二甲基铟 | 120441-92-1 | 999241 |
| Trimethyl(methylcyclopentadienyl)platinum(IV), 99% 三甲基(甲基环戊二烯基)合铂(IV) | 94442-22-5 | 218004 |
钢瓶配件
| 品名 | CAS | 货号 |
|---|---|---|
| Tris(N,N-bis(trimethylsilyl)amide)lanthanum(III), 99.99%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三[N,N-二(三甲基硅烷基)氨基]镧(III) | 35788-99-9 | 116668 |
| Cycloheptatriene molybdenum tricarbonyl, 99% 环庚三烯三羰基钼 | 12125-77-8 | 121252 |
| Bis(t-butylimido)bis(dimethylamino)molybdenum(VI), 98% 双(叔丁基亚氨基)双(二甲基氨基)钼(VI) | 923956-62-1 | 1822342 |
| 50ml Standard cylinder, Suitable for the vast majority of domestic equipments 50mL标准钢瓶 | / | 9395115 |
| 60ml Standard cylinder, Suitable for the equipment of Picosun 60mL标准钢瓶 | / | 9395123 |
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