OFET高性能金属有机前驱体与电极材料
2026-06-10 · 系列介绍 · 百灵威授权转载
在有机场效应晶体管（OFET）中，除了有机半导体活性层，电极材料、界面修饰层及绝缘层的质量同样关键。金属有机前驱体可用于源漏电极（如金、银、铜、铂）的CVD/ALD沉积，或作为p型掺杂剂调控电荷注入。我司提供高纯金属有机化合物（锡、钴、锰、镁、铂等），配合光刻显影液及电子级溶剂，助力OFET器件一体化制备。
产品优势及特点：
- - 高纯金属前驱体：锡、钴、锰、镁、铂等金属有机前驱体，纯度≥99.99% metal basis，适用于热蒸发、CVD/ALD沉积金属或金属氧化物电极。- - 光刻配套试剂：正胶显影液（TMAH基）、负胶显影液、漂洗液，金属杂质含量极低，保障光刻图案精度。
- - 超干清洗溶剂：电子级异丙醇、乙酸丁酯、PGMEA、丙酮等，有效去除光刻胶残留。
- - 柔性电极扩展：银纳米线可用于溶液法透明电极，铜箔可作为栅极或源漏极材料。
应用场景：
- - OFET源漏电极（Au、Ag、Cu、Pt）薄膜沉积- - 金属氧化物介电层（Al₂O₃、HfO₂、ZrO₂）ALD制备
- - 光刻工艺中的显影、漂洗、去胶步骤
- - 柔性透明电极（银纳米线网络）构建
核心推荐产品清单
金属有机前驱体
| 品名 | CAS | 货号 |
|---|---|---|
| Tin(II) acetylacetonate, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(乙酰丙酮酸)锡(II) | 16009-86-2 | 111772 |
| Bis(cyclopentadienyl)cobalt(II), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(环戊二烯基)钴 | 1277-43-6 | 941710 |
| Bis(pentamethylcyclopentadienyl)cobalt(II), ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(五甲基环戊二烯基)钴(II) | 74507-62-3 | 924019 |
| Bis(ethylcyclopentadienyl)manganese, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 二(乙基环戊二烯基)锰(II) | 101923-26-6 | 953383 |
| Bis(pentamethylcyclopentadienyl)magnesium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 双(五甲基环戊二烯基)镁 | 74507-64-5 | 229956 |
| Tris(methylcyclopentadienyl)yttrium, 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(甲基环戊二烯)化钇(III) | 329735-72-0 | 634274 |
| Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)ruthenium(III), 98%, ≥99.99% metal basis, for CVD/ALD, please refer to the details page for ordering and cleaning cylinder 三(2,2,6,6-四甲基-3,5-庚二酮酸)钌 | 38625-54-6 | 147692 |
| Tetrakis(dimethylamino)titanium, ICPMS-99.9999% 四(二甲氨基)钛 | 3275-24-9 | 952803新 |
| Tetrakis(dimethylamino)zirconium, 99% 四(二甲氨基)锆 | 19756-04-8 | 337870 |
光刻显影与清洗试剂
| 品名 | CAS | 货号 |
|---|---|---|
| 3038 Photoresist developer, 2.380 ± 0.01wt%, high-purity, main component TMAH 3038正胶显影液 | / | 9393345新 |
| Negative gel developer FX-A, 95%, High purity 负胶显影液FX-A | / | 9393343 |
| Negative adhesive rinsing solution FP-A, 99.8%, High purity 负胶漂洗液FP-A | / | 9393344 |
| Propylene glycol methyl ether acetate, 99.9%, ELH-Ⅲ 丙二醇单甲醚乙酸酯 | 108-65-6 | 976499 |
| Isopropanol, 99.9%, ELH-Ⅲ 异丙醇 | 67-63-0 | 984033 危化品 |
| Butyl acetate, 99.5%, EL-Ⅲ 乙酸丁酯 | 123-86-4 | 977722 危化品 |
电极/衬底材料与辅助耗材
| 品名 | CAS | 货号 |
|---|---|---|
| Silver nanowires, diam.: <50 nm, length: >10 μm 银纳米线 | 7440-22-4 | 926783 |
| Copper foil (99%) 铜箔 | 7440-50-8 | 93-2992 |
| 50ml Standard cylinder, Suitable for the vast majority of domestic equipments 50mL标准钢瓶 | / | 9395115 |
| 60ml Standard cylinder, Suitable for the equipment of Picosun 60mL标准钢瓶 | / | 9395123 |
| Wafer-scale graphene transfer film, graphene wafer-scale film transfer to silicon substrate, Four inches, Four inches 晶圆级石墨烯转移膜，石墨烯晶圆级薄膜转移到硅衬底，Four inches | / | 9426698 |
| MASK, 130*130mm, Made of 304 stainless steel plate 掩膜板 | / | 9435352 |
| Ethanol, 99.8%, EL-Ⅲ 乙醇 | 64-17-5 | 903038 危化品 |
| Zirconium(IV) isopropoxide isopropanol complex, 99.9%, ICP-99.9% 异丙氧基锆异丙醇复合物 | 14717-56-7 | 960784 |
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